RF sputtered silicon and hafnium nitrides as applied to 440C steel
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RF sputtered silicon and hafnium nitrides as applied to 440C steel

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Published by NASA in [s.l.] .
Written in English


Book details:

Edition Notes

StatementA. Grill and P.R. Aron.
SeriesTechnical memorandum / National Aeronautics and Space Adminisration -- 86862
ContributionsAron, P. R.
ID Numbers
Open LibraryOL14586268M

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Silicon nitride and hafnium nitride coatings were deposited by reactive RF sputtering on oxidized and unoxidized C stainless steel substrates. Sputtering was done in mixtures of argon and nitrogen gases from pressed powder silicon nitride and from hafnium metal targets. Depositions were at two background pressures, 8 and 20 mtorr, and at two different fractions (f) of nitrogen in argon, 0. Silicon nitride and hafnium nitride coatings were deposited by reactive RF sputtering on oxidized and unoxidized C stainless steel substrates. Sputtering was done in mixtures of argon and nitrogen gases from pressed powder silicon nitride and from hafnium metal : A. Grill and P. R. Aron. Silicon nitride and hafnium nitride coatings were deposited by reactive RF sputtering on oxidized and unoxidized C stainless steel substrates. Sputtering was done in mixtures of argon and nitrogen gases from pressed powder silicon nitride and from hafnium metal targets. A. Grill, P.R. Aron () RF-sputtered silicon and hafnium nitrides — properties and adhesion to C stainless steel. Thin Solid Films, , – CrossRef Google ScholarCited by: 2.

Silicon nitride and hafnium nitride coatings were deposited by reactive r.f. sputtering onto oxidized and unoxidized C stainless steel substrates. The coatings and the interface between the coating and substrate were investigated by X-ray diffractometry, scanning electron microscopy and Auger electron by: Among transition metal carbides and nitrides, zirconium, and hafnium compounds are the most stable and have the highest melting temperatures. Here we review published data on phases and phase equilibria in Hf-Zr-C-N-O system, from experiment and ab initio computations with focus on rocksalt Zr and Hf carbides and nitrides, their solid solutions and oxygen solubility by: 3. The reactive sputtering of oxides and nitrides 1 10 lo2 lo3 lo4 lo5 Ion Energy (eV) Figure effects that are seen on growing film surfaces as a function of the energy of the ions that are incident on it, films that are made. They involve placing the insulating or isolated substrate in a dense. Corrosion of Hafnium and Hafnium Alloys D.R. Holmes, ATI Wah Chang, Allegheny Technologies HAFNIUMiselementnumberItresidesin group IVA of the periodic table with titanium and zirconium. Hafnium is always associated with zirconium in minerals such as zircon and baddeleyite, usually in the range of 1 to 5%. The chemical similarity between.

2. Synthesis Methods. Zirconium and hafnium carbides and nitrides can be synthesized by direct reaction of metal or metal hydride powders with graphite or N reactions are strongly exothermic and can be used in a self-propagated high temperature synthesis (SHS) process [].The reaction of oxides with graphite (carbothermal process) is widely used for industrial synthesis of bulk carbide Cited by: 3. Silicon nitride and hafnium nitride coatings were deposited by reactive r.f. sputtering onto oxidized and unoxidized C stainless steel substrates. Silicon nitride thin films were deposited by reactive RF magnetron sputtering. The water-cooled target was a silicon disk (% in purity) with a diameter of 10 cm. Ar and N 2 gases of high-purity (%) were introduced into the sputtering chamber via two separate mass flow by: A. Grill and P.R. Aron, R.F.-sputtered silicon and hafnium nitrides: Properties and adhesion to C stainless steel, Thin Solid Films, () ADS CrossRef Google Scholar W.D. Sproul, Very high rate reactive sputtering of TiN, ZrN and HfN, Thin Author: R. Nowak, S. Maruno.